Microlithography: Process technology for IC fabrication
Material type: TextPublication details: New York: McGraw-Hill book Company, 1986Description: xix, 378pISBN:- 0-07-019304-5
Item type | Current library | Call number | Materials specified | Status | Date due | Barcode |
---|---|---|---|---|---|---|
Books | National Science Library | D 776:621.3.049.77 M6 (Browse shelf(Opens below)) | Available | 168298 |
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D 776:534.5 K3 Principles of color sensitometry: A report of the color sensitometry subcommittee | D 776:534.5 K5 General sensitometry | D 776:534.5(082.2) L3 Photographic sensitivity: Proceedings of the Symposium on Photographic Sensitivity held at Gonville and Caius College and Little Hall, Cambridge, September, 1972 | D 776:621.3.049.77 M6 Microlithography: Process technology for IC fabrication | D 776:659.12(42) L0 Graphic design Britain 70 | D 778.1 K3 Enlarged prints from library microforms: A study of processes, equipment, and materials | D 778.1 K3 Close-up photography and copying |
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