Ion implantation range and energy deposition distributions /IFI/Plenum, Vol. 1 high incident ion energies
Material type: TextPublication details: New York: IFI/Plenum, 1975 Description: xii, 590pSubject(s):Item type | Current library | Call number | Materials specified | Status | Date due | Barcode |
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Books | National Science Library | 541.132.3 L5.1 (Browse shelf(Opens below)) | Available | 65826 |
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541.13 M3 Comprehensive treatise of electrochemistry | 541.13 M4 Comprehensive treatise of electrochemistry | 541.13(083.3) L4 Electrochemical data | 541.132.3 L5.1 Ion implantation range and energy deposition distributions | 541.13"311/313"(082.2) L7 Electrochemistry: The past thirty and the next thirty years | 541.135(02) L3.1 Nonaqueous electrolytes handbook | 541.135(082.2) K2 Electrolytes |
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