000 00409nam a2200145 4500
008 240730b |||||||| |||| 00| 0 eng d
020 _a0070162301
040 _aNational Science Library
_cNational Science Library
080 _a776
_bL5
100 _aDeForest, W S
245 _aPhotoresist:
_bMaterials and processes
260 _aNew York:
_bMcGraw-Hill,
_c1975
300 _axi, 269p.
942 _2udc
_cBK
999 _c65127
_d65127